• 文献标题:   Formation of p-n junction with stable p-doping in graphene field effect transistors using deep UV irradiation
  • 文献类型:   Article
  • 作  者:   IQBAL MZ, SIDDIQUE S, IQBAL MW, EOM J
  • 作者关键词:  
  • 出版物名称:   JOURNAL OF MATERIALS CHEMISTRY C
  • ISSN:   2050-7526 EI 2050-7534
  • 通讯作者地址:   Sejong Univ
  • 被引频次:   33
  • DOI:   10.1039/c3tc30232f
  • 出版年:   2013

▎ 摘  要

We demonstrate the modification of the electronic properties of single layer chemical vapor deposition (CVD)-grown graphene by deep ultraviolet (DUV) light irradiation. The shift in the G and 2D bands in Raman spectra towards higher wavenumber suggests p-doping in graphene field effect transistors (FETs). In the transport measurements, the Dirac point is shifted towards positive gate voltage with increasing DUV light exposure time, revealing the strong p-doping effect without a large resistance increase. The doping is found to be stable in graphene devices, with a slight change in mobilities. We also constructed a p-n junction by DUV light exposure on selected regions of graphene, and investigated it with gate voltage dependent resistivity measurements and current-voltage characteristics.