• 文献标题:   Low energy -plasma thinning and thermal annealing of carbon films to few-layered graphene
  • 文献类型:   Article
  • 作  者:   MILENOV T, AVRAMOVA I, VALCHEVA E, TINCHEV S, AVDEEV G
  • 作者关键词:   highly oriented pyrolytical graphite, graphene, ar+plasma, thermal annealing, raman spectroscopy, xray photoelectron spectroscopy
  • 出版物名称:   OPTICAL QUANTUM ELECTRONICS
  • ISSN:   0306-8919 EI 1572-817X
  • 通讯作者地址:   Bulgarian Acad Sci
  • 被引频次:   2
  • DOI:   10.1007/s11082-014-0067-0
  • 出版年:   2015

▎ 摘  要

Here we present results on the influence of low-energy plasma irradiation of different duration and further annealing on highly oriented pyrolytical graphite (HOPG) layers. We used irradiation with a dose of intended to impact the upper 1 nm thick layer of the treated film. The influence of plasma was evaluated by the results of X-ray powder diffraction (XRD), Raman and X-ray photoelectron spectroscopy (XPS) studies. It was found that the treatment resulted in 20-30 % increasing of the intensity ratios of G and 2D Raman bands of HOPG layers. Moreover, the full width at a half maximum of the 2D band decreases from 80-90 to 55-60 . Further thermal annealing at for 7 min in air atmosphere additionally enhances the ratio in some cases. The XRD and XPS examinations show a significant thinning of the films and increasing of the content of -hybridized carbon. The content of C=O functional groups is increased instead of C-O groups during thermal annealing in air atmosphere.