• 文献标题:   High Q-factor plasmonic resonators in continuous graphene excited by insulator-covered silicon gratings
  • 文献类型:   Article
  • 作  者:   ZHAO Y, CHEN GX, TAO ZC, ZHANG CY, ZHU YW
  • 作者关键词:  
  • 出版物名称:   RSC ADVANCES
  • ISSN:   2046-2069
  • 通讯作者地址:   Univ Sci Technol China
  • 被引频次:   22
  • DOI:   10.1039/c4ra03431g
  • 出版年:   2014

▎ 摘  要

We propose a structure to excite plasmons in large-area continuous graphene films with insulator-covered sub-wavelength silicon gratings (ICSWSG). By numerical simulations we have demonstrated that, after adding a low-permittivity insulator underneath graphene, the graphene/gratings hybrid structure has a high Q-factor (similar to 66) and a sharp notch (with the full width at half maximum of similar to 122 nm) in the transmission spectra at mid-infrared resonant wavelength. Furthermore, the plasmonic properties, e.g. the resonant wavelength, magnitude and Q-factor, can be tuned over a wide range via structure modulation and/or gating of graphene. The transmission dip is achieved over a wide angle range. Finally we demonstrate that such highly confined graphene plasmons could also be excited in graphene sandwiched between silicon gratings and a SiO2 substrate.