• 文献标题:   High Efficiency Epitaxial-Graphene/Silicon-Carbide Photocatalyst with Tunable Photocatalytic Activity and Bandgap Narrowing
  • 文献类型:   Article
  • 作  者:   MATHUR A, DUTTA SB, PAL D, SINGHAL J, SINGH A, CHATTOPADHYAY S
  • 作者关键词:  
  • 出版物名称:   ADVANCED MATERIALS INTERFACES
  • ISSN:   2196-7350
  • 通讯作者地址:   Indian Inst Technol Indore
  • 被引频次:   2
  • DOI:   10.1002/admi.201600413
  • 出版年:   2016

▎ 摘  要

A novel way of tuning photocatalytic activity and bandgap narrowing in epitaxial graphene/silicon carbide (EG/SiC) yields high efficiency photocatalyst. Graphitization of SiC by high-temperature thermal decomposition method with different annealing time forms sets of EG/SiC composites having different quality of graphene layers, confirmed by Raman spectroscopy. The Raman intensity ratio of the 2D band to the G band, I-2D/I-G, represents a measure of quality and quantity of graphene and heterojunction interface layer between EG and SiC. Experimental results reveal that I-2D/I-G plays a crucial role in tuning the bandgap and enhancement of photocatalytic activity of EG/SiC composites in a systematic manner irrespective of crystal structure or size of the SiC particles. In addition, EG/SiC shows intense broad background absorption in the visible range with increasing I-2D/I-G. The suitable selection of I-2D/I-G for EG/SiC gives excellent photocatalytic activity under UV light, up to approximate to 1000% enhancement and remarkable bandgap narrowing, upto 2 eV and even lesser, which is more than approximate to 30% reduction, relative to the as received SiC. The efficient control of the electronic structure in such EG/SiC heterojunctions obtained by tailoring the structural parameter I-2D/I-G opens up promising pathway for bandgap engineering and enhancement of photocatalytic activity.