• 文献标题:   Investigation of plasma-assisted functionalization of pristine single layer graphene
  • 文献类型:   Article
  • 作  者:   TINCU B, AVRAM M, AVRAM A, TUCUREANU V, MIHAI G, POPA M, OSICEANU P, DEMETRESCU I, ENACHESCU M
  • 作者关键词:   slg, pristine graphene, chemical vapor deposition, o2 plasma treatment, structure modification
  • 出版物名称:   CHEMICAL PHYSICS LETTERS
  • ISSN:   0009-2614 EI 1873-4448
  • 通讯作者地址:  
  • 被引频次:   2
  • DOI:   10.1016/j.cplett.2021.139330 EA JAN 2022
  • 出版年:   2022

▎ 摘  要

Investigations on the oxygen plasma treatment of graphene have been already reported in literature, but in this paper, as a novelty, we present a structural conversion of single layer graphene by O-2 plasma treatment. Graphene Oxide is a chemically controlled graphene with hydroxyl, epoxy, carboxyl and carbonyl groups. Low O-2 plasma treatment has been evidenced to be an efficient method to introduce defects and active groups in graphene structure with significantly contribution in biosensor area for detecting pathogens and biomolecules. Single Layer Graphene was grown on copper substrate by Chemical Vapor Deposition method and then transferred by wet chemical technique on gold substrate. Pristine Graphene was exposed to a downstream oxygen plasma and we have investigated the modification of the pristine graphene using Scanning Electron Microscopy (SEM), Raman Spectroscopy, Fourier Transform-Infrared Spectroscopy (FT-IR), X-Ray Diffraction (XRD), and X-Ray Photoelectron Spectroscopy (XPS) to examine the quality and structure modification of pristine graphene.