• 文献标题:   Thin-film barristor: A gate-tunable vertical graphene-pentacene device
  • 文献类型:   Article
  • 作  者:   OJEDAARISTIZABAL C, BAO W, FUHRER MS
  • 作者关键词:  
  • 出版物名称:   PHYSICAL REVIEW B
  • ISSN:   2469-9950 EI 2469-9969
  • 通讯作者地址:   Univ Calif Berkeley
  • 被引频次:   33
  • DOI:   10.1103/PhysRevB.88.035435
  • 出版年:   2013

▎ 摘  要

We fabricate a vertical thin-film barristor device consisting of highly doped silicon (gate), 300 nm SiO2 (gate dielectric), monolayer graphene, pentacene, and a gold top electrode. We show that the current across the device is modulated by the Fermi energy level of graphene, tuned with an external gate voltage. We interpret the device current within the thermionic emission theory, showing a modulation of the energy barrier between graphene and pentacene as large as 300 meV.