• 文献标题:   Minimum Resistance Anisotropy of Epitaxial Graphene on SiC
  • 文献类型:   Article
  • 作  者:   PAKDEHI DM, APROJANZ J, SINTERHAUF A, PIERZ K, KRUSKOPF M, WILLKE P, BARINGHAUS J, STOCKMANN JP, TRAEGER GA, HOHLS F, TEGENKAMP C, WENDEROTH M, AHLERS FJ, SCHUMACHER HW
  • 作者关键词:   sic epitaxial graphene, isotropic conductance, resistance anisotropy, uniform growth, sic terrace step, bilayerfree graphene, scanning tunneling potentiometry
  • 出版物名称:   ACS APPLIED MATERIALS INTERFACES
  • ISSN:   1944-8244
  • 通讯作者地址:   Phys Tech Bundesanstalt
  • 被引频次:   11
  • DOI:   10.1021/acsami.7b18641
  • 出版年:   2018

▎ 摘  要

We report on electronic transport measurements in rotational square probe configuration in combination with scanning tunneling potentiometry of epitaxial graphene monolayers which were fabricated by polymer-assisted sublimation growth on SiC substrates. The absence of bilayer graphene on the ultralow step edges of below 0.75 nm scrutinized by atomic force microscopy and scanning tunneling microscopy result in a not yet observed resistance isotropy of graphene on 4H- and 6H-SiC(0001) substrates as low as 2%. We combine microscopic electronic properties with nanoscale transport experiments and thereby disentangle the underlying microscopic scattering mechanism to explain the remaining resistance anisotropy. Eventually, this can be entirely attributed to the resistance and the number of substrate steps which induce local scattering. Thereby, our data represent the ultimate limit for resistance isotropy of epitaxial graphene on SiC for the given miscut of the substrate.