• 文献标题:   Blister-free ion beam patterning of supported graphene
  • 文献类型:   Article
  • 作  者:   HERBIG C, AHLGREN EH, MICHELY T
  • 作者关键词:   graphene, ion irradiation, trapping, erosion, sputtering yield
  • 出版物名称:   NANOTECHNOLOGY
  • ISSN:   0957-4484 EI 1361-6528
  • 通讯作者地址:   II Phys Inst
  • 被引频次:   2
  • DOI:   10.1088/1361-6528/aa527c
  • 出版年:   2017

▎ 摘  要

Ion irradiation of metal supported two-dimensional layers results over a broad parameter space in noble gas trapping at the interface of the two-dimensional layer and the metal substrate. Trapping may give rise to the formation of gas filled blisters which deteriorate the structural and electronic properties of graphene. Here, we investigate the dependence of noble gas trapping at a graphene/Ir(111) interface and of graphene sputtering on the angle of incidence using scanning tunneling microscopy. Our experimental results are compared to dedicated molecular dynamics simulations. We find that at large impact angles of approximate to 80 degrees. graphene can be eroded without noble gas trapping and thereby establish conditions for nanopatterning without concomitant blister formation.