• 文献标题:   Influence on graphene doping characteristic by developer
  • 文献类型:   Article
  • 作  者:   MENG JH, ZHANG XN, QIN F
  • 作者关键词:   graphene, doping, developer
  • 出版物名称:   OPTOELECTRONICS ADVANCED MATERIALSRAPID COMMUNICATIONS
  • ISSN:   1842-6573 EI 2065-3824
  • 通讯作者地址:   Chongqing Univ
  • 被引频次:   0
  • DOI:  
  • 出版年:   2017

▎ 摘  要

In this paper, one contrast experiment is reported. Two identical back-gate graphene transistors samples are fabricated. One is washed by developer for 3 minutes and washed by deionized water for 10 seconds. The other is washed only by water for 10 seconds. For the first sample, the Dirac point voltage of a graphene transistor decrease 35 V, while that of a graphene transistor in the second sample increase more than 17 V. This phenomenon indicates that developer can decrease P-doping of graphene, and reasons have been analyzed. While the first sample is exposed in atmosphere for a week, Dirac point voltages are still less than those before washed. This result shows that the influence of developer has not disappeared.