• 文献标题:   The Dependence of Graphene Raman D-band on Carrier Density
  • 文献类型:   Article
  • 作  者:   LIU JK, LI QQ, ZOU Y, QIAN QK, JIN YH, LI GH, JIANG KL, FAN SS
  • 作者关键词:   graphene, raman spectroscopy, doping, carrier density, defect
  • 出版物名称:   NANO LETTERS
  • ISSN:   1530-6984 EI 1530-6992
  • 通讯作者地址:   Tsinghua Univ
  • 被引频次:   48
  • DOI:   10.1021/nl4035048
  • 出版年:   2013

▎ 摘  要

Raman spectroscopy has been an integral part of graphene research and can provide information about graphene structure, electronic characteristics, and electron-phonon interactions. In this study, the characteristics of the graphene Raman D-band, which vary with carrier density, are studied in detail, including the frequency, frill width half-maximum, and intensity. We find the Raman D-band frequency increases for hole doping and decreases for electron doping. The Raman D-band intensity increases when the Fermi level approaches half of the excitation energy and is higher in the case of electron doping than that of hole doping. These variations can be explained by electron-phonon interaction theory and quantum interference between different Raman pathways in graphene. The intensity ratio of Raman D- and G-band, which is important for defects characterization in graphene, shows a strong dependence on carrier density.