• 文献标题:   Fabrication of Graphene Directly on SiO2 without Transfer Processes by Annealing Sputtered Amorphous Carbon
  • 文献类型:   Article
  • 作  者:   SATO M, INUKAI M, IKENAGA E, MURO T, OGAWA S, TAKAKUWA Y, NAKANO H, KAWABATA A, NIHEI M, YOKOYAMA N
  • 作者关键词:  
  • 出版物名称:   JAPANESE JOURNAL OF APPLIED PHYSICS
  • ISSN:   0021-4922
  • 通讯作者地址:   Natl Inst Adv Ind Sci Technol
  • 被引频次:   11
  • DOI:   10.1143/JJAP.51.04DB01
  • 出版年:   2012

▎ 摘  要

We fabricated multilayer graphene directly on SiO2 by annealing sputtered amorphous carbon with a catalyst-a simple non-chemical vapor deposition method-without the use of complicated transfer processes. Structural analysis revealed that the graphene sheets formed an epitaxial structure aligned to the Co(111) surface between the Co catalyst and SiO2 dielectric. In the multilayer graphene, a resistivity of approximately 500 mu Omega cm was obtained, which is one order of magnitude higher than that of highly oriented pyrolytic graphite. (C) 2012 The Japan Society of Applied Physics