• 文献标题:   A novel Tunneling Graphene Nano Ribbon Field Effect Transistor with dual material gate: Numerical studies
  • 文献类型:   Article
  • 作  者:   GHOREISHI SS, SAGHAFI K, YOUSEFI R, MORAVVEJFARSHI MK
  • 作者关键词:   tunneling graphene nano ribbon field effect transistor tgnrfet, nonequilibrium green s function negf, drain induced barrier shortening dibs, ambipolar
  • 出版物名称:   SUPERLATTICES MICROSTRUCTURES
  • ISSN:   0749-6036
  • 通讯作者地址:   Islamic Azad Univ
  • 被引频次:   7
  • DOI:   10.1016/j.spmi.2016.06.034
  • 出版年:   2016

▎ 摘  要

In this work, we present Dual Material Gate Tunneling Graphene Nano-Ribbon Field Effect Transistors (DMG-T-GNRFET) mainly to suppress the am-bipolar current with assumption that sub-threshold swing which is one of the important characteristics of tunneling transistors must not be degraded. In the proposed structure, dual material gates with different work functions are used. Our investigations are based on numerical simulations which self consistently solves the 2D Poisson based on an atomistic mode-space approach and Schrodinger equations, within the Non-Equilibrium Green's (NEGF). The proposed device shows lower off-current and on-off ratio becomes 5order of magnitude greater than the conventional device. Also two different short channel effects: Drain Induced Barrier Shortening (DIBS) and hot-electron effect are improved in the proposed device compare to the main structure. (C) 2016 Elsevier Ltd. All rights reserved.