• 文献标题:   Influence of Metal-Graphene Contact on the Operation and Scalability of Graphene Field-Effect Transistors
  • 文献类型:   Article
  • 作  者:   ZHAO P, ZHANG Q, JENA D, KOSWATTA SO
  • 作者关键词:   densityofstates dos broadening, graphene fieldeffect transistors gfets, metalinduced states mis, sourcetodrain s > d tunneling
  • 出版物名称:   IEEE TRANSACTIONS ON ELECTRON DEVICES
  • ISSN:   0018-9383 EI 1557-9646
  • 通讯作者地址:   Univ Notre Dame
  • 被引频次:   13
  • DOI:   10.1109/TED.2011.2159507
  • 出版年:   2011

▎ 摘  要

We explore the effects of metal contacts on the operation and scalability of 2-D graphene field-effect transistors (GFETs) using detailed numerical device simulations based on the nonequilibrium Green's function formalism self-consistently solved with the Poisson equation at the ballistic limit. Our treatment of metal-graphene (M-G) contacts captures the following: 1) the doping effect due to the shift of the Fermi level in graphene contacts and 2) the density-of-states (DOS) broadening effect inside graphene contacts due to metal-induced states (MIS). Our results confirm the asymmetric transfer characteristics in GFETs due to the doping effect by metal contacts. Furthermore, at higher M-G coupling strengths, the contact DOS broadening effect increases the on-current, while the impact on the minimum current (I-min) in the OFF-state depends on the source-to-drain bias voltage and the work-function difference between graphene and the contact metal. Interestingly, with scaling of the channel length, the MIS inside the channel has a weak influence on I-min even at large M-G coupling strengths, while direct source-to-drain (S -> D) tunneling has a stronger influence. Therefore, channel length scalability of GFETs with sufficient gate control will be mainly limited by direct S -> D tunneling, and not by the MIS.