• 文献标题:   Role of substrate temperature at graphene synthesis in an arc discharge
  • 文献类型:   Article
  • 作  者:   FANG XQ, SHASHURIN A, KEIDAR M
  • 作者关键词:  
  • 出版物名称:   JOURNAL OF APPLIED PHYSICS
  • ISSN:   0021-8979 EI 1089-7550
  • 通讯作者地址:   George Washington Univ
  • 被引频次:   9
  • DOI:   10.1063/1.4930177
  • 出版年:   2015

▎ 摘  要

The substrate temperature required for synthesis of graphene in an arc discharge plasma was studied. It was shown that an increase of copper substrate temperature up to the melting point leads to an increase in the amount of graphene production and the quality of graphene sheets. Favorable range of substrate temperatures for arc-based graphene synthesis was determined, and it is in a relatively narrow range of about 1210-1340 K. (C) 2015 AIP Publishing LLC.