• 文献标题:   Low-temperature growth of graphene nanoplatelets by hot-wire chemical vapour deposition
  • 文献类型:   Article
  • 作  者:   ANUAR NAB, NOR NHM, AWANG RB, NAKAJIMA H, TUNMEE S, TRIPATHI M, DALTON A, GOH BT
  • 作者关键词:   hwcvd, graphene, nanoplatelet, raman mapping, tungsten nanoparticle
  • 出版物名称:   SURFACE COATINGS TECHNOLOGY
  • ISSN:   0257-8972 EI 1879-3347
  • 通讯作者地址:  
  • 被引频次:   6
  • DOI:   10.1016/j.surfcoat.2021.126995 EA FEB 2021
  • 出版年:   2021

▎ 摘  要

With the increasing demand for large-area graphene due to its versatility, there is an imminent requirement for scalable, low-temperature, and high yield growth procedures. In this study, the fabrication of large-area graphene nanoplatelets directly grown on tungsten (W) nanoparticles coated c-Si and quartz substrates by hot-wire chemical vapour deposition was demonstrated. A large area of single and bilayer graphene grown over W adatoms via controlled argon (Ar) plasma treatment varied from 0.5 to 10 min. The finest quality of continuous graphene layer up to an area of 2.56 x 10(4) mu m(2) was prepared at the optimised condition of 1 min, and verified through transmission electron microscopy in conjunction with energy dispersive X-ray, atomic force microscopy, and Raman spectroscopy. The prepared thin film of the carbon layer has excellent optical transparency (> 70%) and lower sheet resistance up to 718.3 Omega/sq. A detailed growth mechanism is proposed for the nucleation of graphene nanoplatelets under the influence of Ar plasma treatment on W nanoparticles.