• 文献标题:   Passivation of Germanium by Graphene
  • 文献类型:   Article
  • 作  者:   DELGADO RR, JACOBBERGER RM, ROY SS, MANGU VS, ARNOLD MS, CAVALLO F, LAGALLY MG
  • 作者关键词:   graphene, germanium, chemical vapor deposition, oxidation, xray photoelectron spectroscopy
  • 出版物名称:   ACS APPLIED MATERIALS INTERFACES
  • ISSN:   1944-8244
  • 通讯作者地址:   Univ Wisconsin
  • 被引频次:   10
  • DOI:   10.1021/acsami.7b03889
  • 出版年:   2017

▎ 摘  要

The oxidation of Ge covered with graphene that is either grown on or transferred to the surface is investigated by X-ray photoelectron spectroscopy, Raman spectroscopy, and transmission electron microscopy. Graphene properly grown by chemical vapor deposition on Ge(100), (111), or (110) effectively inhibits room-temperature oxidation of the surface. When graphene is transferred to the Ge surface, oxidation is reduced relative to that on uncovered Ge but has the same power law dependence. We conclude that access to the graphene/Ge interface must occur via defects in the graphene. The excellent passivation provided by graphene grown on Ge should enhance applications of Ge in the electronic-device industry.