• 文献标题:   In situ observation of stress relaxation in epitaxial graphene
  • 文献类型:   Article
  • 作  者:   N DIAYE AT, VAN GASTEL R, MARTINEZGALERA AJ, CORAUX J, HATTAB H, WALL D, ZU HERINGDORF FJM, HORNVON HOEGEN M, GOMEZRODRIGUEZ JM, POELSEMA B, BUSSE C, MICHELY T
  • 作者关键词:  
  • 出版物名称:   NEW JOURNAL OF PHYSICS
  • ISSN:   1367-2630
  • 通讯作者地址:   Univ Cologne
  • 被引频次:   78
  • DOI:   10.1088/1367-2630/11/11/113056
  • 出版年:   2009

▎ 摘  要

Upon cooling, branched line defects develop in epitaxial graphene grown at high temperature on Pt(111) and Ir(111). Using atomically resolved scanning tunneling microscopy, we demonstrate that these defects are wrinkles in the graphene layer, i.e. stripes of partially delaminated graphene. With low energy electron microscopy (LEEM), we investigate the wrinkling phenomenon in situ. Upon temperature cycling, we observe hysteresis in the appearance and disappearance of the wrinkles. Simultaneously with wrinkle formation a change in bright field imaging intensity of adjacent areas and a shift in the moire spot positions for micro diffraction of such areas takes place. The stress relieved by wrinkle formation results from the mismatch in thermal expansion coefficients of graphene and the substrate. A simple one-dimensional model taking into account the energies related to strain, delamination and bending of graphene is in qualitative agreement with our observations.