• 文献标题:   Ferroelectric-Driven Performance Enhancement of Graphene Field-Effect Transistors Based on Vertical Tunneling Heterostructures
  • 文献类型:   Article
  • 作  者:   YUAN SG, YANG ZB, XIE C, YAN F, DAI JY, LAU SP, CHAN HLW, HAO JH
  • 作者关键词:  
  • 出版物名称:   ADVANCED MATERIALS
  • ISSN:   0935-9648 EI 1521-4095
  • 通讯作者地址:   Hong Kong Polytech Univ
  • 被引频次:   28
  • DOI:   10.1002/adma.201601489
  • 出版年:   2016

▎ 摘  要

A vertical graphene heterostructure field-effect transistor (VGHFET) using an ultrathin ferroelectric film as a tunnel barrier is developed. The heterostructure is capable of providing new degrees of tunability and functionality via coupling between the ferroelectricity and the tunnel current of the VGHFET, which results in a high-performance device. The results pave the way for developing novel atomic-scale 2D heterostructures and devices.