• 文献标题:   A highly conducting graphene film with dual-side molecular n-doping
  • 文献类型:   Article
  • 作  者:   KIM Y, PARK J, KANG J, YOO JM, CHOI K, KIM ES, CHOI JB, HWANG C, NOVOSELOV KS, HONG BH
  • 作者关键词:  
  • 出版物名称:   NANOSCALE
  • ISSN:   2040-3364 EI 2040-3372
  • 通讯作者地址:   Seoul Natl Univ
  • 被引频次:   15
  • DOI:   10.1039/c4nr00479e
  • 出版年:   2014

▎ 摘  要

Doping is an efficient way to engineer the conductivity and the work function of graphene, which is, however, limited to wet-chemical doping or metal deposition particularly for n-doping, Here, we report a simple method of modulating the electrical conductivity of graphene by dual-side molecular n-doping with diethylenetriamine (DETA) on the top and amine-functionalized self-assembled monolayers (SAMs) at the bottom. The resulting charge carrier density of graphene is as high as -1.7 x 10(13) cm(-2), and the sheet resistance is as low as, similar to 86 +/- 39 Omega sq(-1), which is believed to be the lowest sheet resistance of monolayer graphene reported so far. This facile dual-side n-doping strategy would be very useful to optimize the performance of various graphene-based electronic devices.