• 文献标题:   Raman spectra investigation of the defects of chemical vapor deposited multilayer graphene and modified by oxygen plasma treatment
  • 文献类型:   Article, Proceedings Paper
  • 作  者:   LI ZY, XU Y, CAO B, QI L, HE SY, WANG CH, ZHANG JC, WANG JF, XU K
  • 作者关键词:   graphene, defect, raman spectra, oxygenplasma
  • 出版物名称:   SUPERLATTICES MICROSTRUCTURES
  • ISSN:   0749-6036
  • 通讯作者地址:   Soochow Univ
  • 被引频次:   7
  • DOI:   10.1016/j.spmi.2016.03.035
  • 出版年:   2016

▎ 摘  要

Graphene, a two dimensional material, can be modified its properties by defects engineering. Here, we present Raman spectra studies of the multilayer graphene (MLG) fabricated by low-pressure chemical vapor deposition over copper foil, and report that the defects of MLG can be controlled by adjusting methane concentration. Moreover, MLG can be changed from metallic to semiconductoring properties by using oxygen plasma treatment, and we investigate the defects evolution of the graphene after exposing to oxygen plasma by Raman spectra. Our results indicate that the amount of defects in graphene can be changed by regulating the methane concentration and oxygen plasma exposure times, but the primary type of defect in MLG is still boundary-like defect. It is valuable for understanding the physics of defects evolution through artificially generated defects, and such defect engineering will greatly open up the future application of the novel material. (C) 2016 Elsevier Ltd. All rights reserved.