• 文献标题:   Epitaxial Graphene Growth by Carbon Molecular Beam Epitaxy (CMBE)
  • 文献类型:   Article
  • 作  者:   PARK J, MITCHEL WC, GRAZULIS L, SMITH HE, EYINK KG, BOECKL JJ, TOMICH DH, PACLEY SD, HOELSCHER JE
  • 作者关键词:  
  • 出版物名称:   ADVANCED MATERIALS
  • ISSN:   0935-9648
  • 通讯作者地址:   USAF
  • 被引频次:   79
  • DOI:   10.1002/adma.201000756
  • 出版年:   2010

▎ 摘  要

A novel growth method (carbon molecular beam epitaxy (CMBE)) has been developed to produce high-quality and large. area epitaxial graphene. This method demonstrates significantly improved controllability of the graphene growth. CM BE with C(60) produces AB stacked graphene, while growth with the graphite filament results in non-Bernal stacked graphene layers with a Dirac-like electronic structure, which is similar to graphene grown by thermal decomposition on SiC (000-1).