• 文献标题:   Schottky barrier modulation of a GaTe/graphene heterostructure by interlayer distance and perpendicular electric field
  • 文献类型:   Article
  • 作  者:   LI HH, ZHOU ZP, ZHANG KL, WANG HY
  • 作者关键词:   gate, graphene, schottky barrier, strain, layerdistance, electric field
  • 出版物名称:   NANOTECHNOLOGY
  • ISSN:   0957-4484 EI 1361-6528
  • 通讯作者地址:   Henan Normal Univ
  • 被引频次:   3
  • DOI:   10.1088/1361-6528/ab2d67
  • 出版年:   2019

▎ 摘  要

Two-dimensional materials have recently been the focus of extensive research. Graphene-based vertical van der Waals heterostructures are expected to design and fabricate novel electronic and optoelectronic devices. Monolayer gallium telluride is a graphene-like nanosheet synthesized in experiment. Here, the electronic properties of GaTe/graphene heterostructures are investigated under the interlayer coupling and the applied perpendicular electric field. The results show that the electronic properties of GaTe and graphene are preserved, and the energy bandgap of graphene is opened to 13.5 meV in the GaTe/graphene heterostructure. It is found that the n-type Schottky contact is formed in the GaTe/graphene heterostructure, which can be tuned by the interlayer coupling, and the applied electric field. Moreover, a transformation from n-type to p-type Schottky contact is observed when the interlayer distance is smaller than 3.15 angstrom or the applied electric field is larger than 0.05 V angstrom(-1). These properties are fundamental to the design of new Schottky nanodevices based on the GaTe/graphene heterostructure.