• 文献标题:   Electrostatic imaging of encapsulated graphene
  • 文献类型:   Article
  • 作  者:   ALTVATER MA, WU S, ZHANG ZY, ZHU TH, LI GH, WATANABE K, TANIGUCHI T, ANDREI EY
  • 作者关键词:   graphene, heterostructure, afm, efm, kpfm, skpm, imaging
  • 出版物名称:   2D MATERIALS
  • ISSN:   2053-1583
  • 通讯作者地址:   Rutgers State Univ
  • 被引频次:   2
  • DOI:   10.1088/2053-1583/ab254e
  • 出版年:   2019

▎ 摘  要

Devices made from two-dimensional (2D) materials such as graphene and transition metal dichalcogenides exhibit remarkable electronic properties of interest to many subdisciplines of nanoscience. Owing to their 2D nature, their quality is highly susceptible to contamination and degradation when exposed to the ambient environment. Protecting the 2D layers by encapsulation between hexagonal boron nitride (hBN) layers significantly improves their quality. Locating these samples within the encapsulant and assessing their integrity prior to further processing then becomes challenging. Here we show that conductive scanning probe techniques such as electrostatic force and Kelvin force microscopy make it possible to visualize the encapsulated layers, their charge environment and local defects on the sub-micrometer scale. Our techniques are employed without requiring electrical contact to the embedded layer, providing valuable feedback on the device's local electronic quality prior to any device etching or electrode deposition. We show that these measurement modes, which are simple extensions of atomic force microscopy, are perfectly suited for imaging encapsulated conductors and their local charge environments.