• 文献标题:   Tunable Radiation Response in Hybrid Organic-Inorganic Gate Dielectrics for Low-Voltage Graphene Electronics
  • 文献类型:   Article
  • 作  者:   ARNOLD HN, CRESS CD, MCMORROW JJ, SCHMUCKER SW, SANGWAN VK, JABERANSARI L, KUMAR R, PUNTAMBEKAR KP, LUCK KA, MARKS TJ, HERSAM MC
  • 作者关键词:   chemical vapor deposition graphene, hybrid dielectric, fieldeffect transistor, lowvoltage electronic, radiation effect, total ionizing dose
  • 出版物名称:   ACS APPLIED MATERIALS INTERFACES
  • ISSN:   1944-8244
  • 通讯作者地址:   Northwestern Univ
  • 被引频次:   10
  • DOI:   10.1021/acsami.5b12259
  • 出版年:   2016

▎ 摘  要

Solution-processed semiconductor and dielectric materials are attractive for future lightweight, low-voltage, flexible electronics, but their response to ionizing radiation environments is not well understood. Here, we investigate the radiation response of graphene field-effect transistors employing multilayer, solution-processed zirconia self-assembled nanodielectrics (Zr-SANDs) with ZrOx as a control. Total ionizing dose (TID) testing is carried out in situ using a vacuum ultraviolet source to a total radiant exposure (RE) of 23.1 mu J/cm(2). The data reveal competing charge density accumulation within and between the individual dielectric layers. Additional measurements of a modified Zr-SAND show that varying individual layer thicknesses within the gate dielectric tuned the TID response. This study thus establishes that the radiation response of graphene electronics can be tailored to achieve a desired radiation sensitivity by incorporating hybrid organic-inorganic gate dielectrics.