• 文献标题:   Analysis of Graphene Tunnel Field-Effect Transistors for Analog/RF Applications
  • 文献类型:   Article
  • 作  者:   RAWAT B, PAILY R
  • 作者关键词:   cutoff frequency, doping engineering, drain overlap, drain underlap, graphene tunnel fet tgfet, intrinsic gain, quasisaturation, scaling behavior
  • 出版物名称:   IEEE TRANSACTIONS ON ELECTRON DEVICES
  • ISSN:   0018-9383 EI 1557-9646
  • 通讯作者地址:   IIT Guwahati
  • 被引频次:   8
  • DOI:   10.1109/TED.2015.2441092
  • 出版年:   2015

▎ 摘  要

The recent findings of quasi-saturation and negative differential resistance in graphene FET have motivated the researchers to improve the current saturation behavior. We suggest that tunnel FET (TFET) with graphene can be a potential candidate for better current saturation. In this regard, the electronic transport in zero bandgap graphene TFET (T-GFET) is studied through the self-consistent solution of Schrodinger equation within ballistic nonequilibrium Green's function formalism, and 2-D Poisson's equation. We show that the appropriate drain overlap, and channel and drain doping concentrations in T-GFET can significantly suppress the channel to drain tunneling current and, consequently, enhance the current saturation. Despite T-GFET's lower ON-current, it shows moderately higher intrinsic gain, compared with conventional graphene FET (C-GFET). Furthermore, the channel length dependence of intrinsic gain and cutoff frequency for T-GFET is investigated and compared with C-GFET.