• 文献标题:   Graphene growth on AlN templates on silicon using propane-hydrogen chemical vapor deposition
  • 文献类型:   Article
  • 作  者:   MICHON A, TIBERJ A, VEZIAN S, ROUDON E, LEFEBVRE D, PORTAIL M, ZIELINSKI M, CHASSAGNE T, CAMASSEL J, CORDIER Y
  • 作者关键词:  
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951 EI 1077-3118
  • 通讯作者地址:   CNRS
  • 被引频次:   11
  • DOI:   10.1063/1.4866285
  • 出版年:   2014

▎ 摘  要

While the integration of graphene on semiconductor surfaces is important to develop new applications, epitaxial graphene has only been integrated on SiC substrates or 3C-SiC/Si templates. In this work, we explore the possibility of growing graphene on AlN/Si(111) templates. Using a chemical vapor deposition process with propane as the carbon source, we have obtained graphitic films (from 2 to 10 graphene layers) on AlN/Si(111) while preserving the morphology of the AlN layer beneath the graphitic film. This study is an important step for the integration of graphene with semiconductors other than SiC. (C) 2014 AIP Publishing LLC.