• 文献标题:   Graphene prepared on SiC by chemical vapor deposition process at low temperature
  • 文献类型:   Article
  • 作  者:   MACHAC P
  • 作者关键词:   graphene, cvd proces, sic
  • 出版物名称:   JOURNAL OF ELECTRICAL ENGINEERINGELEKTROTECHNICKY CASOPIS
  • ISSN:   1335-3632 EI 1339-309X
  • 通讯作者地址:   Univ Chem Technol
  • 被引频次:   0
  • DOI:   10.2478/jee-2019-0064
  • 出版年:   2019

▎ 摘  要

Graphene preparation by the method of chemical vapour deposition on SiC substrates is described. Despite very low growth temperature (1080 degrees C) and with use of methane atmosphere, carbon layers in the form of multi-layer graphene were prepared. Graphene quality was verified by means of available analytical methods: Raman spectroscopy, X-ray photoelectron spectroscopy, Van der Paw method.