• 文献标题:   Band modification of graphene by using slow Cs+ ions
  • 文献类型:   Article
  • 作  者:   SUNG S, LEE SH, LEE P, KIM J, PARK H, RYU M, KIM N, HWANG C, JHI SH, CHUNG J
  • 作者关键词:  
  • 出版物名称:   RSC ADVANCES
  • ISSN:   2046-2069
  • 通讯作者地址:   Pohang Univ Sci Technol
  • 被引频次:   6
  • DOI:   10.1039/c5ra24482j
  • 出版年:   2016

▎ 摘  要

We report new wide band gap engineering for graphene using slow Cs+ ions, which allows both fine-tuning and on-off switching capability of the band gap in a range suitable for most applications without modifying or deteriorating the relativistic nature of the Dirac fermions. The doping of Cs+ ions opens the band gap up to E-g = 0.68 eV, which can be closed completely by adding neutral Cs atoms, as observed in angle-resolved photoemission spectroscopy. The operating mechanism of this band gap engineering is understood by a simple capacitor model, which is fully supported by the density-functional theory calculations.