• 文献标题:   Method for determining the residual electron- and hole-densities about the neutrality point over the gate-controlled n <-> p transition in graphene
  • 文献类型:   Article
  • 作  者:   MANI RG
  • 作者关键词:  
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951 EI 1077-3118
  • 通讯作者地址:   Georgia State Univ
  • 被引频次:   6
  • DOI:   10.1063/1.4940363
  • 出版年:   2016

▎ 摘  要

The Hall effect and the diagonal resistance, which indicates a residual resistivity rho(xx) approximate to h/4e(2), are experimentally examined over the p <-> n transition about the nominal neutrality point in chemical vapor deposition (CVD) grown graphene. A distribution of neutrality potentials is invoked in conjunction with multi-carrier conduction to model the experimental observations. From the modeling, we extract the effective residual electron- and hole-densities around the nominal neutrality point. The results indicate mixed transport due to co-existing electrons and holes in large area zero-band gap CVD graphene devices, which indicates domain confined ambipolar currents broadly over the gate-induced n <-> p transition. (C) 2016 AIP Publishing LLC.