• 文献标题:   Flexible bottom-gate graphene transistors on Parylene C substrate and the effect of current annealing
  • 文献类型:   Article
  • 作  者:   PARK DW, KIM H, BONG J, MIKAEL S, KIM TJ, WILLIAMS JC, MA ZQ
  • 作者关键词:  
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951 EI 1077-3118
  • 通讯作者地址:   Univ Wisconsin
  • 被引频次:   2
  • DOI:   10.1063/1.4964853
  • 出版年:   2016

▎ 摘  要

Flexible graphene transistors built on a biocompatible Parylene C substrate would enable active circuitry to be integrated into flexible implantable biomedical devices. An annealing method to improve the performance of a flexible transistor without damaging the flexible substrate is also desirable. Here, we present a fabrication method of a flexible graphene transistor with a bottom-gate coplanar structure on a Parylene C substrate. Also, a current annealing method and its effect on the device performance have been studied. The localized heat generated by the current annealing method improves the drain current, which is attributed to the decreased contact resistance between graphene and S/D electrodes. A maximum current annealing power in the Parylene C-based graphene transistor has been extracted to provide a guideline for an appropriate current annealing. The fabricated flexible graphene transistor shows a field-effect mobility, maximum transconductance, and a I-on/I-off ratio of 533.5 cm(2)/V s, 58.1 mu S, and 1.76, respectively. The low temperature process and the current annealing method presented here would be useful to fabricate two-dimensional materials-based flexible electronics. Published by AIP Publishing.