▎ 摘　　要

Here we present a detailed study of the chemical vapor deposition (CVD) method used in a real-time regime for graphene film fabrication on nickel foils. Thin films with a wide range of thicknesses (from 3 up to 53 layers and more) have been obtained. A home-made cold-wall chamber for CVD realization is demonstrated in this work. It is supplied with tools for in situ monitoring the temperature-dependent electrical resistance of nickel substrate to obtain a desired number of graphene layers in the sample synthesized. An area of 1 x 1 cm(2) appeared to be covered by graphene. Raman spectroscopy and optical absorption spectroscopy are used to estimate the quality of graphene films fabricated and the graphene layer number.