• 文献标题:   Defect-Free Graphene Synthesized Directly at 150 degrees C via Chemical Vapor Deposition with No Transfer
  • 文献类型:   Article
  • 作  者:   PARK BJ, CHOI JS, EOM JH, HA H, KIM HY, LEE S, SHIN H, YOON SG
  • 作者关键词:   direct graphene synthesis via cvd, ti buffer layer, flexible substrate, synthesis temperature of 150 degrees c, defectfree monolayer graphene
  • 出版物名称:   ACS NANO
  • ISSN:   1936-0851 EI 1936-086X
  • 通讯作者地址:   Chungnam Natl Univ
  • 被引频次:   9
  • DOI:   10.1021/acsnano.8b00015
  • 出版年:   2018

▎ 摘  要

Direct graphene synthesis on substrates via chemical vapor deposition (CVD) is an attractive approach for manufacturing flexible electronic devices. The temperature for graphene synthesis must be below similar to 200 degrees C to prevent substrate deformation while fabricating flexible devices on plastic substrates. Herein, we report a process whereby defect-free graphene is directly synthesized on a variety of substrates via the introduction of an ultrathin Ti catalytic layer, due to the strong affinity of Ti to carbon. Ti with a thickness of 10 nm was naturally oxidized by exposure to air before and after the graphene synthesis, and the various functions of neither the substrates nor the graphene were influenced. This report offers experimental evidence of high-quality graphene synthesis on Ti-coated substrates at 150 degrees C via CVD. The proposed methodology was applied to the fabrication of flexible and transparent thin-film capacitors with top electrodes of high-quality graphene.