• 文献标题:   Fermi velocity engineering in graphene by substrate modification
  • 文献类型:   Article
  • 作  者:   HWANG C, SIEGEL DA, MO SK, REGAN W, ISMACH A, ZHANG YG, ZETTL A, LANZARA A
  • 作者关键词:  
  • 出版物名称:   SCIENTIFIC REPORTS
  • ISSN:   2045-2322
  • 通讯作者地址:   Univ Calif Berkeley
  • 被引频次:   179
  • DOI:   10.1038/srep00590
  • 出版年:   2012

▎ 摘  要

The Fermi velocity, v(F), is one of the key concepts in the study of a material, as it bears information on a variety of fundamental properties. Upon increasing demand on the device applications, graphene is viewed as a prototypical system for engineering v(F). Indeed, several efforts have succeeded in modifying v(F) by varying charge carrier concentration, n. Here we present a powerful but simple new way to engineer v(F) while holding n constant. We find that when the environment embedding graphene is modified, the v(F) of graphene is (i) inversely proportional to its dielectric constant, reaching v(F) similar to 2.5 x 10(6) m/s, the highest value for graphene on any substrate studied so far and (ii) clearly distinguished from an ordinary Fermi liquid. The method demonstrated here provides a new route toward Fermi velocity engineering in a variety of two-dimensional electron systems including topological insulators.