• 文献标题:   Top-Gated Epitaxial Graphene FETs on Si-Face SiC Wafers With a Peak Transconductance of 600 mS/mm
  • 文献类型:   Article
  • 作  者:   MOON JS, CURTIS D, BUI S, HU M, GASKILL DK, TEDESCO JL, ASBECK P, JERNIGAN GG, VANMIL BL, MYERSWARD RL, EDDY CR, CAMPBELL PM, WENG X
  • 作者关键词:   fieldeffect mobility, graphene, nfet, pfet, si mosfet, transistor
  • 出版物名称:   IEEE ELECTRON DEVICE LETTERS
  • ISSN:   0741-3106
  • 通讯作者地址:   HRL Labs LLC
  • 被引频次:   104
  • DOI:   10.1109/LED.2010.2040132
  • 出版年:   2010

▎ 摘  要

In this letter, we present state-of-the-art performance of top-gated graphene n-FETs and p-FETs fabricated with epitaxial graphene layers grown on Si-face 6H-SiC substrates on 50-mm wafers. The current-voltage characteristics of these devices show excellent saturation with ON-state current densities (I(on)) of 0.59 A/mm at V(ds) = 1 V and 1.65 A/mm at V(ds) = 3 V. I(on)/I(off) ratios of 12 and 19 were measured at V(ds) = 1 and 0.5 V, respectively. A peak extrinsic g(m) as high as 600 mS/mm was measured at V(ds) = 3.05 V, with a gate length of 2.94 mu m. The field-effect mobility versus effective electric field (E(eff)) was measured for the first time in epitaxial graphene FETs, where record field-effect mobilities of 6000 cm(2)/V . s for electrons and 3200 cm(2)/V . s for holes were obtained at E(eff) similar to 0.27 MV/cm.