• 文献标题:   Vertically oriented few-layer graphene as an electron field-emitter
  • 文献类型:   Article
  • 作  者:   BEHURA SK, MUKHOPADHYAY I, HIROSE A, YANG QQ, JANI O
  • 作者关键词:   chemical vapor deposition, fewlayer graphene, field emission
  • 出版物名称:   PHYSICA STATUS SOLIDI AAPPLICATIONS MATERIALS SCIENCE
  • ISSN:   1862-6300 EI 1862-6319
  • 通讯作者地址:   Univ Saskatchewan
  • 被引频次:   17
  • DOI:   10.1002/pssa.201329172
  • 出版年:   2013

▎ 摘  要

Field emission from flat graphene sheets is a challenge due to fewer emission sites. Here, we have synthesized free-standing vertically oriented few-layer graphene (FLG) films directly on dielectric substrates by hot-filament chemical vapor deposition (HFCVD) without any catalyst or special substrate treatment. The fabricated FLGs with a large smooth surface topography, standing roughly vertical to the substrate are found to grow according to the Stranski-Krastanov growth mechanism. The ease of large-area preparation and the low turn-on field of 22V mu m(-1) in addition to the large field enhancement factor of approximate to 6520 for electron field emission suggest that the vertically oriented FLGs could be used as a potential edge emitter. [GRAPHICS] Scanning electron microscopy image of vertically oriented few-layer graphene on a SiO2/Si substrate with the schematic of field electron emission.(C) 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim