• 文献标题:   Synthesis of few-layer graphene via microwave plasma-enhanced chemical vapour deposition
  • 文献类型:   Article
  • 作  者:   MALESEVIC A, VITCHEV R, SCHOUTEDEN K, VOLODIN A, ZHANG L, VAN TENDELOO G, VANHULSEL A, VAN HAESENDONCK C
  • 作者关键词:  
  • 出版物名称:   NANOTECHNOLOGY
  • ISSN:   0957-4484 EI 1361-6528
  • 通讯作者地址:   Flemish Inst Technol Res
  • 被引频次:   290
  • DOI:   10.1088/0957-4484/19/30/305604
  • 出版年:   2008

▎ 摘  要

If graphene is ever going to live up to the promises of future nanoelectronic devices, an easy and cheap route for mass production is an essential requirement. A way to extend the capabilities of plasma-enhanced chemical vapour deposition to the synthesis of freestanding few-layer graphene is presented. Micrometre-wide flakes consisting of four to six atomic layers of stacked graphene sheets have been synthesized by controlled recombination of carbon radicals in a microwave plasma. A simple and highly reproducible technique is essential, since the resulting flakes can be synthesized without the need for a catalyst on the surface of any substrate that withstands elevated temperatures up to 700 degrees C. A thorough structural analysis of the flakes is performed with electron microscopy, x-ray diffraction, Raman spectroscopy and scanning tunnelling microscopy. The resulting graphene flakes are aligned vertically to the substrate surface and grow according to a three-step process, as revealed by the combined analysis of electron microscopy and x-ray photoelectron spectroscopy.