• 文献标题:   I-V and C-V Characterization of a High-Responsivity Graphene/Silicon Photodiode with Embedded MOS Capacitor
  • 文献类型:   Article
  • 作  者:   LUONGO G, GIUBILEO F, GENOVESE L, IEMMO L, MARTUCCIELLO N, DI BARTOLOMEO A
  • 作者关键词:   graphene, schottky barrier, mos capacitor, photodiode, photocurrent
  • 出版物名称:   NANOMATERIALS
  • ISSN:   2079-4991
  • 通讯作者地址:   Univ Salerno
  • 被引频次:   21
  • DOI:   10.3390/nano7070158
  • 出版年:   2017

▎ 摘  要

We study the effect of temperature and light on the I-V and C-V characteristics of a graphene/silicon Schottky diode. The device exhibits a reverse-bias photocurrent exceeding the forward current and achieves a photoresponsivity as high as 2.5 A/W. We show that the enhanced photocurrent is due to photo-generated carriers injected in the graphene/Si junction from the parasitic graphene/SiO2/Si capacitor connected in parallel to the diode. The same mechanism can occur with thermally generated carriers, which contribute to the high leakage current often observed in graphene/Si junctions.