• 文献标题:   Nonvolatile memory devices based on few-layer graphene films
  • 文献类型:   Article
  • 作  者:   DOH YJ, YI GC
  • 作者关键词:  
  • 出版物名称:   NANOTECHNOLOGY
  • ISSN:   0957-4484 EI 1361-6528
  • 通讯作者地址:   Seoul Natl Univ
  • 被引频次:   37
  • DOI:   10.1088/0957-4484/21/10/105204
  • 出版年:   2010

▎ 摘  要

We report on the electrical characteristics of few-layer graphene (FLG) field-effect devices with their various thicknesses. In combination with a ferroelectric polymer layer of poly(vinylidene fluoride/trifluoroethylene) [P(VDF/TrFE)], FLG/ferroelectric devices exhibited nonvolatile resistance changes due to a polarization switching of the P(VDF/TrFE) layer. The bistability and retention properties were highly sensitive to the FLG thickness, which is attributed to a charge screening effect in FLG films.