▎ 摘　　要

Graphene is a fascinating two-dimensional material that is being widely investigated for use in electronic devices due to its unique electronic and materials properties. Also, because of its high thermal stability and inertness, it is considered a promising candidate for use as a protection layer for metal substrates. Here, graphene films grown on Ru(0001) are held at 600 K while exposed to oxygen (O-2) and then investigated with helium low-energy ion scattering (LEIS). LEIS spectra collected at different scattering angles confirm that oxygen does not adsorb to graphene but instead intercalates between the graphene and the substrate. The intercalated O-2 desorbs when the sample is annealed to 800 K. It is shown that this is a much lower temperature than is needed to remove chemisorbed atomic oxygen from Ru, thus inferring that the intercalated oxygen is molecular. During the desorption process, some of the graphene is etched away via a chemical reaction with the oxygen, with the proportion desorbing as O-2 or reacting to etch the graphene being dependent on the amount of intercalated O-2.