• 文献标题:   The mechanism and process of spontaneous boron doping in graphene in the theoretical perspective
  • 文献类型:   Article
  • 作  者:   DENG XH, ZENG J, SI MS, LU W
  • 作者关键词:  
  • 出版物名称:   PHYSICS LETTERS A
  • ISSN:   0375-9601 EI 1873-2429
  • 通讯作者地址:   Hengyang Normal Univ
  • 被引频次:   2
  • DOI:   10.1016/j.physleta.2016.08.002
  • 出版年:   2016

▎ 摘  要

A theoretical model is presented that reveals the mechanism of spontaneous boron doping of graphene and is consistent with the microwave plasma experiment choosing trimethylboron as the doping source (Tang et al. (2012) [19]). The spontaneous boron doping originates from the synergistic effect of B and other groups (C, H, CH, CH2 or CH3) decomposing from trimethylboron. This work successfully explains the above experimental phenomenon and proposes a novel and feasible method aiming at B doping of graphene. The mechanism presented here may be also suitable for other two-dimensional carbon-based materials. (C) 2016 Elsevier B.V. All rights reserved.