• 文献标题:   Graphene: Materials to devices (invited)
  • 文献类型:   Article, Proceedings Paper
  • 作  者:   CHAE J, HA J, BAEK H, KUK Y, JUNG SY, SONG YJ, ZHITENEV NB, STROSCIO JA, WOO SJ, SON YW
  • 作者关键词:   graphene device, gate insulator, carrier scattering, scanning probe microscopy
  • 出版物名称:   MICROELECTRONIC ENGINEERING
  • ISSN:   0167-9317 EI 1873-5568
  • 通讯作者地址:   Seoul Natl Univ
  • 被引频次:   3
  • DOI:   10.1016/j.mee.2011.03.159
  • 出版年:   2011

▎ 摘  要

Despite recent progress in understanding geometric structure, electronic structure, and transport properties in a graphene device (GD), role of point defects, edges, traps in a GD or a gate insulator has been poorly defined. We have studied electronic and geometric structures of these defects using scanning probe microscopy and try to link those with the transport properties of the GD. We perform scanning gate microscopy study to understand the local carrier scattering. It was found that geometric corrugations, defects and edges directly influence the local transport current. This observation is linked directly with a proposed scattering model based on macroscopic transport measurements. We suggest that dangling bonds in insulator-material SiO2 mainly used in GDs produce charge puddles and they work as scattering centers. (C) 2011 Elsevier B.V. All rights reserved.