• 文献标题:   Tunable n- and p-type doping of single-layer graphene by engineering its interaction with the SiO2 support
  • 文献类型:   Article
  • 作  者:   NOURBAKHSH A, CANTORO M, LI B, MULLER R, DE FEYTER S, HEYNS MM, SELS BF, DE GENDT S
  • 作者关键词:   graphene, aminosilane, raman spectroscopy, field effect transistor
  • 出版物名称:   PHYSICA STATUS SOLIDIRAPID RESEARCH LETTERS
  • ISSN:   1862-6254
  • 通讯作者地址:   IMEC
  • 被引频次:   6
  • DOI:   10.1002/pssr.201105429
  • 出版年:   2012

▎ 摘  要

We report a technique to tune the excess charge concentration in single-layer graphene from p- to n-type up to densities of |n| similar to 1.2 x 10(13) cm(-2), corresponding to a displacement electric field of similar to 2.5 V/nm. The tuning is achieved by engineering the interaction between graphene and the underlying Si/SiO2 substrate with an amino group-terminated self-assembled monolayer, and subsequent rinsing in aqueous solutions at controlled pH. Raman spectroscopy and electrical measurements on treated graphene devices confirm the occurrence of doping. Interestingly, we found the field-effect mobility not to be significantly affected by the procedure. (C) 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim