• 文献标题:   Epitaxial Growth and Band Structure of Te Film on Graphene
  • 文献类型:   Article
  • 作  者:   HUANG XC, GUAN JQ, LIN ZJ, LIU B, XING SY, WANG WH, GUO JD
  • 作者关键词:   tellurium, helical chain, molecular beam epitaxy, scanning tunneling microscopy, semiconducting band gap, optoelectronic
  • 出版物名称:   NANO LETTERS
  • ISSN:   1530-6984 EI 1530-6992
  • 通讯作者地址:   Chinese Acad Sci
  • 被引频次:   43
  • DOI:   10.1021/acs.nanolett.7b01029
  • 出版年:   2017

▎ 摘  要

Tellurium (Te) films with monolayer and few-layer thickness are obtained by molecular beam epitaxy on a graphene/6H-SiC(0001) substrate and investigated by in situ scanning tunneling microscopy and spectroscopy (STM/STS). We reveal that the Te films are composed of parallel-arranged helical Te chains flat-lying-on the graphene surface, exposing the (1 X 1) facet of (10 (1) over bar0) of the bulk crystal. The band gap of Te films increases monotonically with decreasing thickness, reaching the near-infrared band for the monolayer Te. An explicit band bending at the edge between the monolayer Te and graphene substrate is visualized. With the thickness controlled in the atomic scale, Te films show potential applications of electronics and optoelectronics.