• 文献标题:   Controllable Synthesis of Circular Graphene Domains by Atmosphere Pressure Chemical Vapor Deposition
  • 文献类型:   Article
  • 作  者:   JIANG BB, PAN M, WANG C, WU MH, VINODGOPAL K, DAI GP
  • 作者关键词:  
  • 出版物名称:   JOURNAL OF PHYSICAL CHEMISTRY C
  • ISSN:   1932-7447
  • 通讯作者地址:   Nanchang Univ
  • 被引频次:   3
  • DOI:   10.1021/acs.jpcc.7b12626
  • 出版年:   2018

▎ 摘  要

Controlled growth of circular single-crystalline graphene domains has been achieved by atmospheric pressure chemical vapor deposition (APCVD) using solid copper as substrate, thereby demonstrating that the shape of the graphene grains can potentially be precisely tuned by optimizing growth parameters. Scanning electron microscopy (SEM) and atomic force microscopy (AFM) show that the round domains have smooth, clean edges that permit seamless merging of adjacent graphene. Transmission electron microscopy (TEM) and Raman spectra together indicate that the graphene film is mostly monolayer, and electron diffraction reveals that these domains are single crystals. The growth and merging of these circular graphene domains to yield single-crystal graphene films enable us to elucidate the nucleation and growth mechanism of graphene on solid copper foil substrates.