• 文献标题:   Upscaling high-quality CVD graphene devices to 100 micron-scale and beyond
  • 文献类型:   Article
  • 作  者:   LYON TJ, SICHAU J, DORN A, ZURUTUZA A, PESQUERA A, CENTENO A, BLICK RH
  • 作者关键词:  
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951 EI 1077-3118
  • 通讯作者地址:   Univ Hamburg
  • 被引频次:   4
  • DOI:   10.1063/1.4978643
  • 出版年:   2017

▎ 摘  要

We describe a method for transferring ultra large-scale chemical vapor deposition-grown graphene sheets. These samples can be fabricated as large as several cm 2 and are characterized by magneto-transport measurements on SiO2 substrates. The process we have developed is highly effective and limits damage to the graphene all the way through metal liftoff, as shown in carrier mobility measurements and the observation of the quantum Hall effect. The charge-neutral point is shown to move drastically to near-zero gate voltage after a 2-step post-fabrication annealing process, which also allows for greatly diminished hysteresis. Published by AIP Publishing.