• 文献标题:   Sub-10 nm graphene nano-ribbon tunnel field-effect transistor
  • 文献类型:   Article
  • 作  者:   HAMAM AMM, SCHMIDT ME, MURUGANATHAN M, SUZUKI S, MIZUTA H
  • 作者关键词:  
  • 出版物名称:   CARBON
  • ISSN:   0008-6223 EI 1873-3891
  • 通讯作者地址:   Japan Adv Inst Sci Technol
  • 被引频次:   12
  • DOI:   10.1016/j.carbon.2017.09.091
  • 出版年:   2018

▎ 摘  要

We report a temperature independent subthreshold slope (SS) of similar to 47 mV/dec at low temperature in a triple top gate graphene tunnel field-effect transistor (TFET). The outer gates are used to define the p and n-doped regions of the similar to 9.4 nm wide graphene nanoribbon, while the middle gate is used to switch the device between the ON and OFF states. Due to the flexibility of electrostatic doping, the device characteristics are compared in different configurations, specifically, field-effect transistor (FET) mode and TFET mode. A minimum SS of similar to 47 mV/dec along with a saturation current density of similar to 8.51 mA/mm is realized in the case of TFET mode at 5 K. This low SS is found to be temperature independent up to 40 K, after which an exponential increase is observed with a slope of 8.4 V/dec at 300 K. In clear contrast, linear temperature dependence of the SS is found in the case of FET mode. (C) 2017 Elsevier Ltd. All rights reserved.