▎ 摘　　要

Few layers isolated graphene domains were grown by microwave surface wave plasma CVD technique using camphor at low temperature. Graphene nucleation centers were suppressed on pre-annealed copper foils by supplying low dissociation energy. Scanning electron microscopy study of time dependent growth reveals that graphene nucleation centers were preciously suppressed, which indicates the possibility of controlled growth of large area single crystal graphene domains by plasma processing. Raman spectroscopy revealed that the graphene domains are few layered which consist of relatively low defects.