• 文献标题:   Ultraviolet-light-driven photoresponse of chemical vapor deposition grown molybdenum disulfide/graphene heterostructured FET
  • 文献类型:   Article
  • 作  者:   IQBAL MZ, KHAN S, SIDDIQUE S
  • 作者关键词:   graphene, molybdenum disulfide, deep ultraviolet light duv, heterostructured fet, uv sensor
  • 出版物名称:   APPLIED SURFACE SCIENCE
  • ISSN:   0169-4332 EI 1873-5584
  • 通讯作者地址:   GIK Inst Engn Sci Technol
  • 被引频次:   3
  • DOI:   10.1016/j.apsusc.2018.08.027
  • 出版年:   2018

▎ 摘  要

Two dimensional materials such as graphene and transition metal dichalcogenides (TMDC) have gained profound research interest as novel optical material owing to their remarkable optical and electrical properties. The formation of atomically controlled van der Waals (vdW) heterostructured architectures facilitates comprehending innovative photosensing and optoelectronic devices exhibiting unique properties than conventional counterparts. We have demonstrated the use of MoS2/graphene heterostructured field effect transistor (FET) for photosensing applications. For different drain to source voltages (V-ds), the effect of DUV irradiations is studied, revealing an increased photoresponse. Optical performance of FET is studied by evaluating photoresponsivity (R-lambda), detectivity (D*) and external quantum efficiency (EQE). Optical response with R-lambda and D* approaching 3.34 x 10(3) AW(-1) and 1.004 x 10(12) jones, respectively is obtained. This approach of creating TMDCs/graphene based heterostructured devices provide new insights for development of high performance photosensors for next generation optical and sensing applications.