• 文献标题:   Effect of ultraviolet light irradiation and ion collision on the quality of multilayer graphene prepared by microwave surface-wave plasma chemical vapor deposition
  • 文献类型:   Article
  • 作  者:   ICHIMURA S, HAYASHI Y, UMENO M
  • 作者关键词:   graphite, nanostructure, plasma cvd, defect characterization, surface characterization
  • 出版物名称:   DIAMOND RELATED MATERIALS
  • ISSN:   0925-9635 EI 1879-0062
  • 通讯作者地址:   Okayama Univ
  • 被引频次:   3
  • DOI:   10.1016/j.diamond.2016.04.012
  • 出版年:   2016

▎ 摘  要

We successfully synthesized graphene by microwave surface-wave plasma chemical vapor deposition (CVD) and investigated the effect of UV light and ion collision from the plasma exposure during graphene synthesis. The graphene obtained here was multilayer graphene consisting of approximately 5 layers according to crosssectional transmission electron microscopy results. The quality of the graphene was compared between the.case where UV light was irradiated from the plasma and the case where the UV light was blocked by a grid inserted CVD configuration. Quality was evaluated by Raman scattering spectroscopy. There were more defects in the graphene prepared with irradiation of UV light than with blocking of UV light. Furthermore, we investigated the effects of ion collisions that occurred in the plasma, but they had no effect on graphene quality. These results suggest that during graphene synthesis, UV light from the plasma affects its crystallinity. The electrical conductivity, optical transmittance and mobility of the transferred graphene films were measured to clarify the effects of UV light irradiation. (C) 2016 Elsevier B.V. All rights reserved.