• 文献标题:   Monolayer graphene growth on sputtered thin film platinum
  • 文献类型:   Article
  • 作  者:   KANG BJ, MUN JH, HWANG CY, CHO BJ
  • 作者关键词:  
  • 出版物名称:   JOURNAL OF APPLIED PHYSICS
  • ISSN:   0021-8979 EI 1089-7550
  • 通讯作者地址:   Korea Adv Inst Sci Technol
  • 被引频次:   63
  • DOI:   10.1063/1.3254193
  • 出版年:   2009

▎ 摘  要

It is demonstrated that sputtered thin film platinum (Pt) can be used as a catalytic metal for graphene growth on metal. During the crystallization annealing, the sputtered Pt is crystallized mostly into Pt (111) orientation, maintaining excellent surface roughness with no sign of agglomeration. The relatively lower carbon solubility in Pt and the good surface roughness of the thin film Pt enable us to form a uniform monolayer graphene on Pt over the entire region of the thin film Pt/SiO2/Si substrate by carbon dissolution and segregation method processed in a methane ambient. The monolayer graphene grown on Pt has been successfully transferred to SiO2/Si substrate by simple wet etching of Pt. The results of Raman spectroscopic and scanning tunneling microscopic measurements of the synthesized graphene layer are presented. (C) 2009 American Institute of Physics. [doi:10.1063/1.3254193]